목록 게시판 리스트 옵션 검색 A new patterning technique on UV sensitive transparent film with chip embedded photomask Author Oktay Yarimaga, Tae Won Kim, Yun Kyung Jung, Maesoon Im, Bonsang Gu, Hyun Gyu Park, and Yang-Kyu Choi Conference name The 15th Asia-Pacific Workshop on Fundamental and Application of Advanced Semiconductor Devices (AWAD), pp. 320-323 Location Gyeongju, South Korea Conference date Jun. 25-27, 2007